The global ALD Systems market size is projected to reach USD 3.24 billion by 2029

ALD systems is a versatile research deposition tool for thermal or energy enhanced ALD. Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of ALD reactions use two chemicals called precursors (also called "reactants"). These precursors react with the surface of a material one at a time in a sequential, self-limiting, manner. A thin film is slowly deposited through repeated exposure to separate precursors. ALD is a key process in fabricating semiconductor devices, and part of the set of tools for synthesising nanomaterials.

According to the new market research report “Global ALD Systems Market Report 2023-2029”, published by GlobalInfoResearch, the global ALD Systems market size is projected to reach USD 3.24 billion by 2029, at a CAGR of 8.2% during the forecast period.

• Global ALD Systems MarketSize(US$ Million), 2018-2029

Source: GlobalInfoResearch, “Global ALD Systems Market 2023 by Manufacturers, Regions, Type and Application, Forecast to 2029”

• GlobalALD SystemsTop 16 Players Ranking and Market Share（Based on data of 2021, Continually updated）

Source: GlobalInfoResearch, “Global ALD Systems Market 2023 by Manufacturers, Regions, Type and Application, Forecast to 2029”.

The global key manufacturers of ALD Systems include CN1, Solaytec, Oxford Instruments, NCD, Forge Nano, Ideal Deposition, Beneq, NAURA, NAURA, Beneq, etc. In 2022, the global top five players had a share approximately 73.0% in terms of revenue.

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