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A Breastfeeding Pump, often called an electric breast pump, is an electronic device used to extract milk from a mother's breasts. This device helps mothers collect and store milk when needed, such as during work or at night, by simulating the sucking action of a baby, so that it can be fed when the baby needs it. The use of breast pumps not only facilitates mothers' lives, but also provides more possibilities for breastfeeding.

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A Breastfeeding Pump, often called an electric breast pump, is an electronic device used to extract milk from a mother's breasts. This device helps mothers collect and store milk when needed, such as during work or at night, by simulating the sucking action of a baby, so that it can be fed when the baby needs it. The use of breast pumps not only facilitates mothers' lives, but also provides more possibilities for breastfeeding.

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Acrylnitril-Butadien-Latex (NR-Latex), also called NB latex, is a synthetic latex which has a milky color and a liquid form and is used for dipping rubber for medical and laboratory gloves, etc. thanks to its excellent tensile strength, oil resistance, etc.

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This report studies the Gallium Nitride (GaN) substrate/wafers.

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This report studies the tungsten CMP slurries, used for Tungsten Bulk CMP and Tungsten Buff CMP. The tungsten CMP slurries are widely used in memory devices manufacturing.

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This report studies the tungsten CMP slurries, used for Tungsten Bulk CMP and Tungsten Buff CMP. The tungsten CMP slurries are widely used in memory devices manufacturing.

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CMP slurries are employed to polish and planarize complex layers of integrated circuits to customer specific requirements. CMP slurries are liquid solutions generally composed of high-purity deionized water and a proprietary mix of chemical additives and engineered abrasives that chemically and mechanically interact at an atomic level with the surface material of the IC device.

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The silica polishing fluid is a commonly used grinding and polishing material, mainly composed of silica particles and solvents or colloids, used to polish and improve the flatness, smoothness and transparency of the material surface.

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Cobalt polishing liquids are widely used in technology nodes of 10nm and below, and cobalt will partially replace copper as wires. Cobalt CMP slurries are designed to polish cobalt and barrier metals and planarize all films in the circuits during advanced Cobalt interconnect polish.

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Cobalt polishing liquids are widely used in technology nodes of 10nm and below, and cobalt will partially replace copper as wires. Cobalt CMP slurries are designed to polish cobalt and barrier metals and planarize all films in the circuits during advanced Cobalt interconnect polish.

USD4480.00

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