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Total: 3 records, 1 pages

Global SOH (Spin on Hardmasks) Supply, Demand and Key Producers, 2024-2030

date 21 Feb 2024

date Electronics & Semiconductor

new_biaoQian SOH (Spin on Hardmasks)

The global SOH (Spin on Hardmasks) market size is expected to reach $ 763.6 million by 2030, rising at a market growth of 4.8% CAGR during the forecast period (2024-2030).

USD4480.00

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Global SOH (Spin on Hardmasks) Market 2024 by Manufacturers, Regions, Type and Application, Forecast to 2030

date 02 Jan 2024

date Electronics & Semiconductor

new_biaoQian SOH (Spin on Hardmasks)

According to our (Global Info Research) latest study, the global SOH (Spin on Hardmasks) market size was valued at USD 550.5 million in 2023 and is forecast to a readjusted size of USD 763.6 million by 2030 with a CAGR of 4.8% during review period.

USD3480.00

Add To Cart

Add To Cart

Global SOH (Spin on Hardmasks) Market 2023 by Manufacturers, Regions, Type and Application, Forecast to 2029

date 18 Mar 2023

date Electronics & Semiconductor

new_biaoQian SOH (Spin on Hardmasks)

SOH (Spin on Hardmasks) is a membrane applied to the bottom of photoresists, and acts as a barrier in the follow-up etching process.

USD3480.00

Add To Cart

Add To Cart

industry 21 Feb 2024

industry Electronics & Semiconductor

new_biaoQian SOH (Spin on Hardmasks)

The global SOH (Spin on Hardmasks) market size is expected to reach $ 763.6 million by 2030, rising at a market growth of 4.8% CAGR during the forecast period (2024-2030).

USD4480.00

addToCart

Add To Cart

industry 02 Jan 2024

industry Electronics & Semiconductor

new_biaoQian SOH (Spin on Hardmasks)

According to our (Global Info Research) latest study, the global SOH (Spin on Hardmasks) market size was valued at USD 550.5 million in 2023 and is forecast to a readjusted size of USD 763.6 million by 2030 with a CAGR of 4.8% during review period.

USD3480.00

addToCart

Add To Cart

industry 18 Mar 2023

industry Electronics & Semiconductor

new_biaoQian SOH (Spin on Hardmasks)

SOH (Spin on Hardmasks) is a membrane applied to the bottom of photoresists, and acts as a barrier in the follow-up etching process.

USD3480.00

addToCart

Add To Cart